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Precision Ceramic Bond Diamond Grinding Wheel / Wafer Thinning Wheel – for Silicon Wafer Polishing & Back Grinding
Precision Ceramic Bond Diamond Grinding Wheel / Wafer Thinning Wheel – for Silicon Wafer Polishing & Back Grinding
Precision Ceramic Bond Diamond Grinding Wheel / Wafer Thinning Wheel – for Silicon Wafer Polishing & Back Grinding
Precision Ceramic Bond Diamond Grinding Wheel / Wafer Thinning Wheel – for Silicon Wafer Polishing & Back Grinding
Precision Ceramic Bond Diamond Grinding Wheel / Wafer Thinning Wheel – for Silicon Wafer Polishing & Back Grinding
Precision Ceramic Bond Diamond Grinding Wheel / Wafer Thinning Wheel – for Silicon Wafer Polishing & Back Grinding

Precision Ceramic Bond Diamond Grinding Wheel / Wafer Thinning Wheel – for Silicon Wafer Polishing & Back Grinding

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Product Attributes

Model No.HNKM60721

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Product Description

Product Name:

Ceramic Bond Diamond Wafer Thinning & Polishing Wheel (for Silicon Wafer Processing)

Key Specifications:

 
 
Parameter Value
Product Type Ceramic / vitrified bond diamond grinding wheel
Application Silicon wafer back grinding, thinning, and polishing
Target Material Single-crystal silicon wafers, semiconductor substrates
Key Features High precision, low damage, excellent surface finish
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Product Description:

This precision ceramic bond diamond grinding wheel is specifically designed for silicon wafer back grinding, thinning, and polishing – critical processes in semiconductor manufacturing.

Unlike resin or metal bond wheels, the ceramic (vitrified) bond provides:

  • Excellent self-sharpening performance – fresh diamond continuously exposed

  • High strength and wear resistance – long wheel life

  • Good porosity – efficient chip removal and heat dissipation

  • Superior form-holding – maintains flatness and geometry

The ceramic bond structure creates a porous network that allows for:

  • Cool grinding – low grinding temperature, prevents wafer damage

  • Sharp cutting action – high grinding efficiency

  • Reduced subsurface damage – critical for wafer integrity

Typical applications include:

  • ✅ Silicon wafer back thinning (back grinding)

  • ✅ Wafer polishing and surface finishing

  • ✅ Semiconductor substrate preparation

  • ✅ LED substrate processing (sapphire, SiC, GaN)

Key Features:

 
 
Feature Benefit
Ceramic / vitrified bond Excellent self-sharpening, high porosity, cool grinding
Diamond abrasive Essential for hard semiconductor materials
High precision TTV <5μm, surface roughness <10nm achievable
Low damage Reduced subsurface damage layer
Long life High wear resistance – lower cost per wafer

Why Ceramic Bond for Silicon Wafer Grinding?

 
 
Bond Type Best For Characteristics
Ceramic / Vitrified Coarse and semi-finish grinding High strength, good self-sharpening, easy to dress
Resin Bond Fine grinding and polishing Self-sharpening, good surface finish, low grinding force
Metal Bond Heavy stock removal High durability, long life, runs hotter

The ceramic bond is the preferred choice for rough and semi-finish grinding of silicon wafers, offering an optimal balance of material removal rate and surface quality.

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